Quantum point contact model of filamentary conduction in resistive switching memories

The quantum point contact (QPC) model, originally developed to model the conduction after soft and hard breakdown events in thin-oxide MOS devices, is applied to resistive random access memories (RRAM). The QPC model is based on the idea that the conducting filament (CF) behaves as a quantum wire and it is shown to adequately describe the conduction in the low-resistance state (LRS) and in the high-resistance state (HRS). These two regimes show linear and nonlinear current-voltage (I-V) characteristics, respectively. In the LRS, the CF shows metallic conduction properties and the signature of conductance quantization. In the HRS, the conduction is linear at low and high enough voltages, and it is strongly nonlinear in the transition between these two linear regimes. After showing that the model is adequate for both the LRS and the HRS, the QPC picture is used to provide a compact model for the whole dynamic switching cycle of CF-based RRAM devices and memristors.

[1]  M. Nafria,et al.  Point contact conduction at the oxide breakdown of MOS devices , 1998, International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217).

[2]  J. Sune,et al.  Post soft breakdown conduction in SiO/sub 2/ gate oxides , 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

[3]  J. Sune,et al.  Analytic modeling of leakage current through multiple breakdown paths in SiO/sub 2/ films , 2001, 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167).

[4]  Jan M. van Ruitenbeek,et al.  Quantum properties of atomic-sized conductors , 2002, cond-mat/0208239.

[5]  A. Sawa Resistive switching in transition metal oxides , 2008 .

[6]  R. Dittmann,et al.  Redox‐Based Resistive Switching Memories – Nanoionic Mechanisms, Prospects, and Challenges , 2009, Advanced materials.

[7]  L. Goux,et al.  Generic learning of TDDB applied to RRAM for improved understanding of conduction and switching mechanism through multiple filaments , 2010, 2010 International Electron Devices Meeting.

[8]  E. Miranda,et al.  Model for the Resistive Switching Effect in $ \hbox{HfO}_{2}$ MIM Structures Based on the Transmission Properties of Narrow Constrictions , 2010, IEEE Electron Device Letters.

[9]  R. Waser,et al.  Thermochemical resistive switching: materials, mechanisms, and scaling projections , 2011 .

[10]  C. Cagli,et al.  Experimental and theoretical study of electrode effects in HfO2 based RRAM , 2011, 2011 International Electron Devices Meeting.

[11]  D. Jeong,et al.  Nanofilamentary resistive switching in binary oxide system; a review on the present status and outlook , 2011, Nanotechnology.