High performance source optimization using a gradient-based method in optical lithography
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[1] Gabriella Kókai,et al. Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems , 2004, EvoWorkshops.
[2] Harry J. Levinson,et al. Principles of Lithography , 2001 .
[3] Alan E. Rosenbluth,et al. Optimum mask and source patterns to print a given shape , 2002 .
[4] Eytan Barouch,et al. Optimization of stepper parameters and their influence on OPC , 1996, Advanced Lithography.
[5] Eytan Barouch,et al. Illuminator optimization for projection printing , 1999, Advanced Lithography.
[6] Kafai Lai,et al. Benefits and trade-offs of global source optimization in optical lithography , 2009, Advanced Lithography.
[7] Scott Halle,et al. Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process , 2009, Advanced Lithography.
[8] Chris A. Mack. Optimum stepper performance through image manipulation , 2004 .
[9] Tsai-Sheng Gau,et al. Customized illumination aperture filter for low k1 photolithography process , 2000, Advanced Lithography.
[10] Vikram Tolani,et al. Source-mask co-optimization (SMO) using level set methods , 2009, Photomask Technology.
[11] G. Arce,et al. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography. , 2009, Optics express.
[12] George E. Bailey,et al. Effective multicutline QUASAR illumination optimization for SRAM and logic , 2003, SPIE Advanced Lithography.
[13] D. Fehrs,et al. Illuminator modification of an optical aligner , 2004 .
[14] Aasutosh Dave,et al. Pushing the limits of RET with different illumination optimization methods , 2009, Advanced Lithography.