Sensitivity of an optimized contour mask technique to errors in fabricating piecewise continuous relief diffractive optical elements

This paper considers the effect of errors in the technological process using an optimized contour mask technique for fabricating piecewise continuous relief diffractive optical elements on the reduction in the backward slopes of diffraction zones and the increase in the diffraction efficiency of the elements. The process parameter tolerances necessary for the implementation of the method are within the parameters of the standard microelectronic processes and equipment. The proposed method can be useful for laser writing systems and projection lithography that form the relief in a photoresist with a backward slope width exceeding 1 µm since it provides a significant improvement in the performance of the fabricated diffraction structures.