Process Dependence of Proton-Induced Degradation in GaN HEMTs

The 1.8-MeV proton radiation responses are compared for AlGaN/GaN HEMTs grown under Ga-rich, N-rich, and NH3-rich conditions. The NH3-rich devices are more susceptible to proton irradiation than the Ga-rich and N-rich devices. The 1/ f noise of the devices increases with increasing fluence. Density functional theory calculations show that N vacancies and Ga-N divacancies lead to enhanced noise in these devices.

[1]  D. Fleetwood,et al.  1/f noise and radiation effects in MOS devices , 1994 .

[2]  John H. Scofield,et al.  Physical basis for nondestructive tests of MOS radiation hardness , 1991 .

[3]  D. Rigaud,et al.  1/f noise in MODFETs at low drain bias , 1990 .

[4]  Christiane Poblenz,et al.  X- and Ka-band power performance of AlGaN/GaN HEMTs grown by ammonia-MBE , 2008 .

[5]  A. Touboul,et al.  Electrostatic Mechanisms Responsible for Device Degradation in Proton Irradiated AlGaN/AlN/GaN HEMTs , 2008, IEEE Transactions on Nuclear Science.

[6]  Umesh K. Mishra,et al.  Proton-irradiation effects on AlGaN/AlN/GaN high electron mobility transistors , 2003 .

[7]  L.K.J. Vandamme,et al.  Experimental studies on 1/f noise , 1981 .

[8]  L. Eastman,et al.  Effect of the surface and barrier defects on the AlGaN/GaN HEMT low-frequency noise performance , 2003, IEEE Electron Device Letters.

[9]  A. van der Ziel,et al.  Flicker Noise in Electronic Devices , 1979 .

[10]  peixiong zhao,et al.  Dehydrogenation of defects and hot-electron degradation in GaN high-electron-mobility transistors , 2011 .

[11]  Hongtao Xu,et al.  The effect of gate leakage on the noise figure of AlGaN/GaN HEMTs , 2006, IEEE Electron Device Letters.

[12]  Ronald D. Schrimpf,et al.  1/f Noise in GaN HEMTs grown under Ga-rich, N-rich, and NH3-rich conditions , 2011, Microelectron. Reliab..

[13]  Ronald D. Schrimpf,et al.  Electrical, spectral, and chemical properties of 1.8 MeV proton irradiated AlGaN/GaN HEMT structures as a function of proton fluence , 2003 .

[14]  S. Cai,et al.  Annealing behavior of a proton irradiated Al{sub x}Ga{sub 1{minus}x}N/GaN high electron mobility transistor grown by MBE , 2000 .

[15]  Christiane Poblenz,et al.  Structural Properties of GaN Buffer Layers on 4H-SiC(0001) Grown by Plasma-Assisted Molecular Beam Epitaxy for High Electron Mobility Transistors , 2004 .

[16]  peixiong zhao,et al.  Characterization of 1.8-MeV proton-irradiated AlGaN/GaN field-effect transistor structures by nanoscale depth-resolved luminescence spectroscopy , 2002 .

[17]  R. D. Schrimpf,et al.  Annealing Behavior of a Proton Irradiated Al Ga N/GaN High Electron Mobility Transistor Grown by MBE , 2000 .

[18]  Alexander A. Balandin Gate-voltage dependence of low-frequency noise in GaN/AlGaN heterostructure field-effect transistors , 2000 .

[19]  P. Waltereit,et al.  Power performance of AlGaN-GaN HEMTs grown on SiC by plasma-assisted MBE , 2004, IEEE Electron Device Letters.

[20]  Christiane Poblenz,et al.  Structural and morphological properties of GaN buffer layers grown by ammonia molecular beam epitaxy on SiC substrates for AlGaN/GaN high electron mobility transistors , 2008 .

[21]  T.G.M. Kleinpenning,et al.  Low-frequency noise in modern bipolar transistors: impact of intrinsic transistor and parasitic series resistances , 1994 .

[22]  Umesh K. Mishra,et al.  Electrical-stress-induced degradation in AlGaN/GaN high electron mobility transistors grown under gallium-rich, nitrogen-rich, and ammonia-rich conditions , 2010 .