Interdiffusion and Chemical Trapping at Inp(110) Interfaces with Au, Al, Ni, Cu, and Ti

Note: Univ wisconsin,dept phys,madison,wi 53706. Shapira, y, xerox corp,webster res ctr,webster,ny 14580.ISI Document Delivery No.: TM473 Reference LSE-ARTICLE-1984-026 Record created on 2006-10-03, modified on 2017-05-12

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