A note on the numerical simulation of Kleijn's benchmark problem
暂无分享,去创建一个
[1] Robert J. Kee,et al. A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor , 1989 .
[2] Cornelis Vuik,et al. Numerical methods for CVD simulation , 2006 .
[3] Klavs F. Jensen,et al. Chemical vapor deposition : principles and applications , 1993 .
[4] Willem Hundsdorfer,et al. RKC time-stepping for advection-diffusion-reaction problems , 2004 .
[5] Jan G. Verwer,et al. An Implicit-Explicit Runge-Kutta-Chebyshev Scheme for Diffusion-Reaction Equations , 2004, SIAM J. Sci. Comput..
[6] Chris R. Kleijn,et al. Computational modeling of transport phenomena and detailed chemistry in chemical vapor deposition : a benchmark solution , 2000 .
[7] P. Wesseling. Principles of Computational Fluid Dynamics , 2000 .
[8] C. R. Kleijn. Transport phenomena in chemical vapor deposition reactors , 1991 .
[9] J. Verwer,et al. Numerical solution of time-dependent advection-diffusion-reaction equations , 2003 .
[10] C. Kleijn,et al. Modeling of Chemical Vapor Deposition of Tungsten Films , 1993 .
[11] L. Shampine,et al. RKC: an explicit solver for parabolic PDEs , 1998 .
[12] James Demmel,et al. LAPACK Users' Guide, Third Edition , 1999, Software, Environments and Tools.