Sputtering of silicate glasses

Each of the amorphous films that consists of SiO2, Al2O3, CaO-SiO2, or CaO-Al2O3 system was prepared by rf-sputtering. Changes of film thickness, structure, composition, and transmittance in the visible region depending on the sputtering time were discussed. Especially, the chemical shifts of SiK(alpha) and AlK(alpha) were measured for study of structure and composition of the films by using a high resolution x-ray fluorescence spectrometer with double crystals.