Nanoscale patterning using self-assembled polymers for semiconductor applications
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Charles T. Black | Robert L. Sandstrom | Kathryn W. Guarini | Keith R. Milkove | K. Guarini | C. Black | R. Sandstrom | K. Milkove
[1] Yoshio Gomei. Cost analysis on the next-generation lithography technology , 1999, Advanced Lithography.
[2] C. Hawker,et al. Controlling Polymer-Surface Interactions with Random Copolymer Brushes , 1997, Science.
[3] G. Fredrickson,et al. Block Copolymers—Designer Soft Materials , 1999 .
[4] Richard A. Register,et al. Large area dense nanoscale patterning of arbitrary surfaces , 2001 .
[5] H. Jaeger,et al. Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields , 1996, Science.
[6] Christopher Harrison,et al. Lithography with a mask of block copolymer microstructures , 1998 .
[7] Franco Cerrina,et al. Guided Self-Assembly of Symmetric Diblock Copolymer Films on Chemically Nanopatterned Substrates , 2000 .
[8] Hans C. Pfeiffer. PREVAIL: IBM's e-beam technology for next generation lithography , 2000, Advanced Lithography.
[9] C. Stafford,et al. Nanoscopic Templates from Oriented Block Copolymer Films , 2000 .
[10] K. Guarini,et al. Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication , 2001 .
[11] Ting Xu,et al. The influence of molecular weight on nanoporous polymer films , 2001 .
[12] E. Thomas,et al. Structure of minimum thickness and terraced free‐standing films of block copolymers , 1996 .
[13] K. Guarini,et al. Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates. , 2000, Science.
[14] Lloyd R. Harriott,et al. Next generation lithography , 1998 .
[15] R. H. Stulen,et al. Extreme ultraviolet lithography , 1998 .