Self-heating effect in FinFETs and its impact on devices reliability characterization
暂无分享,去创建一个
K. Wu | Y.-H Lee | S. E. Liu | J. R. Shih | J. H. Lee | J. S. Wang | J. H. Lee | S. E. Liu | W. H. Hsieh | D. S. Huang | Y. R. Lu | C. F. Huang | Y. S. Tsai | J. Shih | K. Wu | Y. Lee | Y. Tsai | C. Huang | W. Hsieh | J. Wang | D. Huang | Y. Lu
[1] M. Nelhiebel,et al. Unambiguous identification of the NBTI recovery mechanism using ultra-fast temperature changes , 2009, 2009 IEEE International Reliability Physics Symposium.
[2] Yiying Wu,et al. Thermal conductivity of individual silicon nanowires , 2003 .
[3] Boris Kozinsky,et al. Role of disorder and anharmonicity in the thermal conductivity of silicon-germanium alloys: a first-principles study. , 2011, Physical review letters.
[4] M. Asheghi,et al. Modeling and Data for Thermal Conductivity of Ultrathin Single-Crystal SOI Layers at High Temperature , 2006, IEEE Transactions on Electron Devices.
[5] A. Rahman,et al. Intrinsic transistor reliability improvements from 22nm tri-gate technology , 2013, 2013 IEEE International Reliability Physics Symposium (IRPS).
[6] P. Abramowitz,et al. Correction of Self-Heating for HCI Lifetime Prediction , 2007, 2007 IEEE International Reliability Physics Symposium Proceedings. 45th Annual.
[7] C. Fiegna,et al. Analysis of Self-Heating Effects in Ultrathin-Body SOI MOSFETs by Device Simulation , 2008, IEEE Transactions on Electron Devices.
[8] S. Natarajan,et al. Self-heat reliability considerations on Intel's 22nm Tri-Gate technology , 2013, 2013 IEEE International Reliability Physics Symposium (IRPS).
[9] Mark Y. Liu,et al. Reliability characterization of 32nm high-K and Metal-Gate logic transistor technology , 2010, 2010 IEEE International Reliability Physics Symposium.