Nanostructure morphology variation modeling and estimation for nanomanufacturing process yield improvement

Nanomanufacturing is critical to the future growth of U.S. manufacturing. Yet the process yield of current nanodevices is typically 10% or less. Particularly in nanomaterials growth, there may exist large variability across the sites on a substrate, which could lead to variability in properties. Essential to the reduction of variability is to mathematically describe the spatial variation of nanostructure. This research therefore aims at a method of modeling and estimating nanostructure morphology variation for process yield improvement. This method consists of (1) morphology variation modeling based on Gaussian Markov random field (GMRF) theory, and (2) maximum likelihood estimation (MLE) of morphology variation model based on measurement data. The research challenge lies in the proper definition and estimation of the interactions among neighboring nanostructures. To model morphology variation, nanostructures on all sites are collectively described as a GMRF. The morphology variation model serves for the space-time growth model of nanostructures. The probability structure of the GMRF is specified by a so-called simultaneous autoregressive scheme, which defines the neighborhood systems for any site on a substrate. The neighborhood system characterizes the interactions among adjacent nanostructures by determining neighbors and their influence on a given site in terms of conditional auto-regression. The conditional

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