Hierarchical Polynomial Chaos for Variation Analysis of Silicon Photonics Microresonators

This paper presents a polynomial chaos (PC) based numerical approach for the variation analysis of silicon photonics microresonators (MRs) in the presence of inevitable fabrication process variations. In particular, we develop low-dimensional component-level PC metamodels of standard quantities of interest which are then used to model the impact of fabrication process variations on the higher dimensional device-level quantities of interest. We demonstrate that the proposed indirect approach is much more computationally efficient when compared with the conventional approach of directly generating PC metamodels for device-level quantities of interest.