Impact Of Molecular Beam Epitaxy On Millimeter Wave And Optical Systems

Molecular beam epitaxy (MBE) is an ultrahigh vacuum evaporation process for growing epitaxial films on a wide variety of substrates. The basic constituents of the films are thermally evaporated and directed toward a heated substrate. The evaporated materials are deposited on the heated substrate surface forming a film. MBE offers the ability to maintain a high level of precise control over material composition and film thickness required for semiconductor devices utilized in microwave, millimeter wave and optical system applications.