Controlled defect creation and removal in graphene and MoS2 monolayers.
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D. W. Li | Zhiyong Xiao | X. Hong | Lan Jiang | Shouheng Sun | Jingfeng Song | J. Silvain | L. Fan | Y. Lu | Xi Huang | L. Jiang | K. Keramatnejad | H. Rabiee Golgir | Q. Zou | Yongfeng Lu | Dawei Li | H. R. Golgir | Z. Xiao | X. Huang | J. Song | S. Sun | J. F. Song