Through pitch contact hole imaging for the 65nm node
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Will Conley | Robert John Socha | Lloyd C. Litt | Arjan Verhappen | Jan Pieter Kuijten | Martin Chaplin | Scott Warwick
[1] Vincent Wiaux,et al. ArF solutions for low-k1 back-end imaging , 2003, SPIE Advanced Lithography.
[2] Vincent Wiaux,et al. Mighty high-T lithography for 65-nm generation contacts , 2003, SPIE Advanced Lithography.