Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask
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E. Kley | F. Schäfers | Yilin Hong | Xiangdong Xu | Hongjun Zhou | T. Huo | A. Sokolov | M. Sertsu | Keqiang Qiu | Kay Dietrich | S. Kroker | Zhengkun Liu | Y. Liu | Huo-yao Chen | K. Dietrich | Dakui Lin