Lateral ion implant straggle and mask proximity effect
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J. Johnson | D. Hoyniak | P. Cottrell | R. Mann | Jeff S. Brown | T. Hook | E. Adler | Jeff Brown | J. Brown | Eric Adler | Jim Johnson
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[3] A study of buried layer formation using MeV ion implantation for the fabrication of ULSI CMOS devices , 1999 .