Silicon Oxide (SiOx): A Promising Material for Resistance Switching?
暂无分享,去创建一个
J. Yang | I. Valov | D. Ielmini | A. Shluger | E. Miranda | Can Li | A. Kenyon | A. Mehonic | A. Bricalli | E. Ambrosi | D. Gao | Qiangfei Xia
[1] Qi Liu,et al. Breaking the Current‐Retention Dilemma in Cation‐Based Resistive Switching Devices Utilizing Graphene with Controlled Defects , 2018, Advanced materials.
[2] S. Menzel,et al. Field-enhanced route to generating anti-Frenkel pairs in HfO2 , 2018 .
[3] Mark Buckwell,et al. Spike-Timing Dependent Plasticity in Unipolar Silicon Oxide RRAM Devices , 2018, Front. Neurosci..
[4] Anthony J. Kenyon,et al. Light-activated resistance switching in SiOx RRAM devices , 2017 .
[5] Jiaming Zhang,et al. Analogue signal and image processing with large memristor crossbars , 2017, Nature Electronics.
[6] E. Miranda,et al. Voltage-Driven Hysteresis Model for Resistive Switching: SPICE Modeling and Circuit Applications , 2017, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[7] Rainer Waser,et al. Electrochemical Tantalum Oxide for Resistive Switching Memories , 2017, Advanced materials.
[8] Qing Wu,et al. A novel true random number generator based on a stochastic diffusive memristor , 2017, Nature Communications.
[9] I. Valov. Interfacial interactions and their impact on redox-based resistive switching memories (ReRAMs) , 2017 .
[10] A Mehonic,et al. Intrinsic Resistance Switching in Amorphous Silicon Suboxides: The Role of Columnar Microstructure , 2017, Scientific Reports.
[11] J. Yang,et al. Truly Electroforming‐Free and Low‐Energy Memristors with Preconditioned Conductive Tunneling Paths , 2017 .
[12] W. Chen,et al. Low-Temperature Characterization of Cu–Cu:Silica-Based Programmable Metallization Cell , 2017, IEEE Electron Device Letters.
[13] T. Kimoto,et al. Appearance of quantum point contact in Pt/NiO/Pt resistive switching cells , 2017 .
[14] Anthony J. Kenyon,et al. Intrinsic resistance switching in amorphous silicon oxide for high performance SiOx ReRAM devices , 2017 .
[15] J. Yang,et al. Three-dimensional crossbar arrays of self-rectifying Si/SiO2/Si memristors , 2017, Nature Communications.
[16] Ilia Valov,et al. Interfacial Metal-Oxide Interactions in Resistive Switching Memories. , 2017, ACS applied materials & interfaces.
[17] A. Shluger,et al. Diffusion and aggregation of oxygen vacancies in amorphous silica , 2017, Journal of physics. Condensed matter : an Institute of Physics journal.
[18] Earl E. Swartzlander,et al. Memcomputing (Memristor + Computing) in Intrinsic SiOx-Based Resistive Switching Memory: Arithmetic Operations for Logic Applications , 2017, IEEE Transactions on Electron Devices.
[19] Alexander L. Shluger,et al. A microscopic mechanism of dielectric breakdown in SiO2 films: An insight from multi-scale modeling , 2017 .
[20] I. Valov,et al. Multibit memory operation of metal-oxide bi-layer memristors , 2017, Scientific Reports.
[21] Jianhui Zhao,et al. Superior resistive switching memory and biological synapse properties based on a simple TiN/SiO2/p-Si tunneling junction structure , 2017 .
[22] R Waser,et al. SET kinetics of electrochemical metallization cells: influence of counter-electrodes in SiO2/Ag based systems , 2017, Nanotechnology.
[23] Jessamyn A. Fairfield,et al. Quantum point contacts and resistive switching in Ni/NiO nanowire junctions , 2016 .
[24] A. Shluger,et al. A mechanism for Frenkel defect creation in amorphous SiO2 facilitated by electron injection , 2016, Nanotechnology.
[25] Alessandro Calderoni,et al. Postcycling Degradation in Metal-Oxide Bipolar Resistive Switching Memory , 2016, IEEE Transactions on Electron Devices.
[26] Yao-Feng Chang,et al. Proton exchange reactions in SiOx-based resistive switching memory: Review and insights from impedance spectroscopy , 2016 .
[27] R. Waser,et al. (Invited) Mobile Ions, Transport and Redox Processes in Memristive Devices , 2016 .
[28] Hao Jiang,et al. Electrochemical metallization switching with a platinum group metal in different oxides. , 2016, Nanoscale.
[29] Wei D. Lu,et al. Nanoscale electrochemistry using dielectric thin films as solid electrolytes. , 2016, Nanoscale.
[30] J. Baugh,et al. Electrical Breakdown in Thin Si Oxide Modeled by a Quantum Point Contact Network , 2016, IEEE Transactions on Electron Devices.
[31] A. Shluger,et al. Nanoscale Transformations in Metastable, Amorphous, Silicon‐Rich Silica , 2016, Advanced materials.
[32] R. Waser,et al. Resistive Switching: From Fundamentals of Nanoionic Redox Processes to Memristive Device Applications , 2016 .
[33] Daniele Ielmini,et al. Resistive switching memories based on metal oxides: mechanisms, reliability and scaling , 2016 .
[34] Masakazu Aono,et al. Humidity effects on the redox reactions and ionic transport in a Cu/Ta2O5/Pt atomic switch structure , 2016 .
[35] Feng Miao,et al. Quantized conductance coincides with state instability and excess noise in tantalum oxide memristors , 2016, Nature Communications.
[36] Anthony J. Kenyon,et al. Nanosecond Analog Programming of Substoichiometric Silicon Oxide Resistive RAM , 2016, IEEE Transactions on Nanotechnology.
[37] C. Hwang,et al. Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures , 2016, Scientific Reports.
[38] Adnan Mehonic,et al. Emulating the Electrical Activity of the Neuron Using a Silicon Oxide RRAM Cell , 2016, Front. Neurosci..
[39] Fei Zhou,et al. Demonstration of Synaptic Behaviors and Resistive Switching Characterizations by Proton Exchange Reactions in Silicon Oxide , 2016, Scientific Reports.
[40] B. Rajendran,et al. A 250 mV Cu/SiO2/W Memristor with Half-Integer Quantum Conductance States. , 2016, Nano letters.
[41] Earl E. Swartzlander,et al. Bidirectional voltage biased implication operations using SiOx based unipolar memristors , 2015 .
[42] Alessandro Calderoni,et al. Engineering ReRAM for high-density applications , 2015 .
[43] E. Vianello,et al. On the Origin of Low-Resistance State Retention Failure in HfO2-Based RRAM and Impact of Doping/Alloying , 2015, IEEE Transactions on Electron Devices.
[44] A. Kenyon,et al. Conductance tomography of conductive filaments in intrinsic silicon-rich silica RRAM , 2015, Nanoscale.
[45] I. Valov,et al. Graphene‐Modified Interface Controls Transition from VCM to ECM Switching Modes in Ta/TaOx Based Memristive Devices , 2015, Advanced materials.
[46] Stefano Ambrogio,et al. Noise-Induced Resistance Broadening in Resistive Switching Memory—Part II: Array Statistics , 2015, IEEE Transactions on Electron Devices.
[47] Alessandro Calderoni,et al. Voltage-Controlled Cycling Endurance of HfOx-Based Resistive-Switching Memory , 2015, IEEE Transactions on Electron Devices.
[48] Jan van den Hurk,et al. Processes and Limitations during Filament Formation and Dissolution in GeSx-based ReRAM Memory Cells , 2015 .
[49] E. Miranda. Compact Model for the Major and Minor Hysteretic I–V Loops in Nonlinear Memristive Devices , 2015, IEEE Transactions on Nanotechnology.
[50] A. Shluger,et al. Optical signatures of intrinsic electron localization in amorphous SiO2 , 2015, Journal of physics. Condensed matter : an Institute of Physics journal.
[51] Stefano Ambrogio,et al. True Random Number Generation by Variability of Resistive Switching in Oxide-Based Devices , 2015, IEEE Journal on Emerging and Selected Topics in Circuits and Systems.
[52] A. P. Yatmanov,et al. Bipolar resistive switching and charge transport in silicon oxide memristor , 2015 .
[53] A. Kenyon,et al. Structural changes and conductance thresholds in metal-free intrinsic SiOx resistive random access memory , 2015 .
[54] Rainer Waser,et al. Modeling of Quantized Conductance Effects in Electrochemical Metallization Cells , 2015, IEEE Transactions on Nanotechnology.
[55] Guido Groeseneken,et al. Endurance degradation mechanisms in TiN\Ta2O5\Ta resistive random-access memory cells , 2015 .
[56] Fei Zeng,et al. Resistive switching and conductance quantization in Ag/SiO2/indium tin oxide resistive memories , 2014 .
[57] Rainer Waser,et al. Impact of the Counter‐Electrode Material on Redox Processes in Resistive Switching Memories , 2014 .
[58] Fei Zhou,et al. Intrinsic SiOx-based unipolar resistive switching memory. I. Oxide stoichiometry effects on reversible switching and program window optimization , 2014 .
[59] James M Tour,et al. Nanoporous silicon oxide memory. , 2014, Nano letters.
[60] Alessandro Calderoni,et al. Statistical Fluctuations in HfOx Resistive-Switching Memory: Part I - Set/Reset Variability , 2014, IEEE Transactions on Electron Devices.
[61] Wei D. Lu,et al. Electrochemical dynamics of nanoscale metallic inclusions in dielectrics , 2014, Nature Communications.
[62] R. Clark. Emerging Applications for High K Materials in VLSI Technology , 2014, Materials.
[63] Anne Siemon,et al. Applicability of Well-Established Memristive Models for Simulations of Resistive Switching Devices , 2014, IEEE Transactions on Circuits and Systems I: Regular Papers.
[64] A. Shluger,et al. Nature of intrinsic and extrinsic electron trapping in SiO2 , 2014 .
[65] M. Lanza. A Review on Resistive Switching in High-k Dielectrics: A Nanoscale Point of View Using Conductive Atomic Force Microscope , 2014, Materials.
[66] Li Ji,et al. Integrated one diode-one resistor architecture in nanopillar SiOx resistive switching memory by nanosphere lithography. , 2014, Nano letters.
[67] Rainer Waser,et al. Nanobattery Effect in RRAMs—Implications on Device Stability and Endurance , 2014, IEEE Electron Device Letters.
[68] Ilia Valov,et al. Redox‐Based Resistive Switching Memories (ReRAMs): Electrochemical Systems at the Atomic Scale , 2014 .
[69] A. J. Kenyon,et al. Quantum Conductance in Silicon Oxide Resistive Memory Devices , 2013, Scientific Reports.
[70] James M Tour,et al. High‐Performance and Low‐Power Rewritable SiOx 1 kbit One Diode–One Resistor Crossbar Memory Array , 2013, Advanced materials.
[71] Hao Jiang,et al. Low voltage resistive switching devices based on chemically produced silicon oxide , 2013 .
[72] F. Zeng,et al. Conductance quantization in oxygen-anion-migration-based resistive switching memory devices , 2013 .
[73] R. Waser,et al. Generic relevance of counter charges for cation-based nanoscale resistive switching memories. , 2013, ACS nano.
[74] Li Ji,et al. Oxygen-induced bi-modal failure phenomenon in SiOx-based resistive switching memory , 2013 .
[75] C. Cagli,et al. Quantum-size effects in hafnium-oxide resistive switching , 2013 .
[76] H. Iwai,et al. Effect of an ultrathin SiO2 interfacial layer on the hysteretic current–voltage characteristics of CeOx-based metal–insulator–metal structures , 2013 .
[77] S. Menzel,et al. Switching kinetics of electrochemical metallization memory cells. , 2013, Physical chemistry chemical physics : PCCP.
[78] R. Soni,et al. Rate limiting step for the switching kinetics in Cu doped Ge0.3Se0.7 based memory devices with symmetrical and asymmetrical electrodes , 2013 .
[79] Jan van den Hurk,et al. Nanobatteries in redox-based resistive switches require extension of memristor theory , 2013, Nature Communications.
[80] Rainer Waser,et al. Bond nature of active metal ions in SiO2-based electrochemical metallization memory cells. , 2013, Nanoscale.
[81] S. Sze,et al. Characteristics and Mechanisms of Silicon-Oxide-Based Resistance Random Access Memory , 2013, IEEE Electron Device Letters.
[82] Ilia Valov,et al. Nucleation and growth phenomena in nanosized electrochemical systems for resistive switching memories , 2013, Journal of Solid State Electrochemistry.
[83] Jun Xu,et al. Resistive switching mechanism in silicon highly rich SiOx (x < 0.75) films based on silicon dangling bonds percolation model , 2013 .
[84] Yen-Ting Chen,et al. Understanding the resistive switching characteristics and mechanism in active SiOx-based resistive switching memory , 2012 .
[85] R. Rizk,et al. Electrically tailored resistance switching in silicon oxide , 2012, Nanotechnology.
[86] T. Hasegawa,et al. Conductance quantization and synaptic behavior in a Ta2O5-based atomic switch , 2012, Nanotechnology.
[87] L. Goux,et al. Balancing SET/RESET Pulse for $>\hbox{10}^{10}$ Endurance in $\hbox{HfO}_{2}\hbox{/Hf}$ 1T1R Bipolar RRAM , 2012, IEEE Transactions on Electron Devices.
[88] Shimeng Yu,et al. A SPICE Compact Model of Metal Oxide Resistive Switching Memory With Variations , 2012, IEEE Electron Device Letters.
[89] E. Miranda,et al. The Quantum Point-Contact Memristor , 2012, IEEE Electron Device Letters.
[90] J. W. McPherson,et al. Time dependent dielectric breakdown physics - Models revisited , 2012, Microelectron. Reliab..
[91] Yen-Ting Chen,et al. Study of polarity effect in SiOx-based resistive switching memory , 2012 .
[92] Yiwei Liu,et al. Observation of Conductance Quantization in Oxide‐Based Resistive Switching Memory , 2012, Advanced materials.
[93] Hiroshi Iwai,et al. Nonlinear conductance quantization effects in CeOx/SiO2-based resistive switching devices , 2012 .
[94] S. Balatti,et al. Resistive Switching by Voltage-Driven Ion Migration in Bipolar RRAM—Part II: Modeling , 2012, IEEE Transactions on Electron Devices.
[95] R. Waser,et al. Nanoionic transport and electrochemical reactions in resistively switching silicon dioxide. , 2012, Nanoscale.
[96] Shimeng Yu,et al. Metal–Oxide RRAM , 2012, Proceedings of the IEEE.
[97] Anthony J. Kenyon,et al. Resistive switching in silicon sub-oxide films , 2012 .
[98] Derek Abbott,et al. Memristive Device Fundamentals and Modeling: Applications to Circuits and Systems Simulation , 2012, Proceedings of the IEEE.
[99] Hao Yu,et al. Analysis and Modeling of Internal State Variables for Dynamic Effects of Nonvolatile Memory Devices , 2012, IEEE Transactions on Circuits and Systems I: Regular Papers.
[100] R. Waser,et al. Effects of Moisture on the Switching Characteristics of Oxide‐Based, Gapless‐Type Atomic Switches , 2012 .
[101] J. Tour,et al. Highly transparent nonvolatile resistive memory devices from silicon oxide and graphene , 2012, Nature Communications.
[102] Yuchao Yang,et al. Observation of conducting filament growth in nanoscale resistive memories , 2012, Nature Communications.
[103] Yasuhisa Naitoh,et al. Non-volatile high-speed resistance switching nanogap junction memory , 2011 .
[104] Rainer Waser,et al. Redox processes in silicon dioxide thin films using copper microelectrodes , 2011 .
[105] Wei Wang,et al. FPGA Based on Integration of CMOS and RRAM , 2011, IEEE Transactions on Very Large Scale Integration (VLSI) Systems.
[106] J. Tour,et al. In situ imaging of the conducting filament in a silicon oxide resistive switch , 2011, Scientific Reports.
[107] M. Tsai,et al. Robust High-Resistance State and Improved Endurance of $\hbox{HfO}_{X}$ Resistive Memory by Suppression of Current Overshoot , 2011, IEEE Electron Device Letters.
[108] Kinam Kim,et al. A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O(5-x)/TaO(2-x) bilayer structures. , 2011, Nature materials.
[109] D. Wolansky,et al. Impact of Temperature on the Resistive Switching Behavior of Embedded $\hbox{HfO}_{2}$-Based RRAM Devices , 2011, IEEE Transactions on Electron Devices.
[110] W. B. Knowlton,et al. A Physical Model of the Temperature Dependence of the Current Through $\hbox{SiO}_{2}\hbox{/}\hbox{HfO}_{2}$ Stacks , 2011, IEEE Transactions on Electron Devices.
[111] Hyunsang Hwang,et al. Resistive switching characteristics of ultra-thin TiOx , 2011 .
[112] S. Long,et al. CMOS Compatible Nonvolatile Memory Devices Based on SiO2/Cu/SiO2 Multilayer Films * , 2011 .
[113] P. Gonon,et al. Back-end-of-line compatible Conductive Bridging RAM based on Cu and SiO2 , 2011 .
[114] Peng Li,et al. Dynamical Properties and Design Analysis for Nonvolatile Memristor Memories , 2011, IEEE Transactions on Circuits and Systems I: Regular Papers.
[115] L. Chua. Resistance switching memories are memristors , 2011, Handbook of Memristor Networks.
[116] J. Yang,et al. High switching endurance in TaOx memristive devices , 2010 .
[117] Myoung-Jae Lee,et al. Modeling for bipolar resistive memory switching in transition-metal oxides , 2010 .
[118] J. Tour,et al. Resistive switches and memories from silicon oxide. , 2010, Nano letters.
[119] E. Miranda,et al. Model for the Resistive Switching Effect in $ \hbox{HfO}_{2}$ MIM Structures Based on the Transmission Properties of Narrow Constrictions , 2010, IEEE Electron Device Letters.
[120] Sung-Mo Kang,et al. Compact Models for Memristors Based on Charge-Flux Constitutive Relationships , 2010, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[121] Hyunsang Hwang,et al. Investigation of State Stability of Low-Resistance State in Resistive Memory , 2010, IEEE Electron Device Letters.
[122] D. Ielmini,et al. Size-Dependent Retention Time in NiO-Based Resistive-Switching Memories , 2010, IEEE Electron Device Letters.
[123] Wei Yang Lu,et al. Nanoscale memristor device as synapse in neuromorphic systems. , 2010, Nano letters.
[124] J. Yang,et al. Electrical transport and thermometry of electroformed titanium dioxide memristive switches , 2009 .
[125] J. Yang,et al. Switching dynamics in titanium dioxide memristive devices , 2009 .
[126] J. Yang,et al. A Family of Electronically Reconfigurable Nanodevices , 2009 .
[127] Ru Huang,et al. Unipolar Resistive Switch Based on Silicon Monoxide Realized by CMOS Technology , 2009, IEEE Electron Device Letters.
[128] R. Dittmann,et al. Redox‐Based Resistive Switching Memories – Nanoionic Mechanisms, Prospects, and Challenges , 2009, Advanced materials.
[129] Kin Leong Pey,et al. The radial distribution of defects in a percolation path , 2008 .
[130] Stephen J. Wolf,et al. The elusive memristor: properties of basic electrical circuits , 2008, 0807.3994.
[131] J. Yang,et al. Memristive switching mechanism for metal/oxide/metal nanodevices. , 2008, Nature nanotechnology.
[132] M. Breitwisch. Phase Change Memory , 2008, 2008 International Interconnect Technology Conference.
[133] D. Stewart,et al. The missing memristor found , 2008, Nature.
[134] M. Kozicki,et al. Low current resistive switching in Cu–SiO2 cells , 2008 .
[135] M. Kozicki,et al. Bipolar and Unipolar Resistive Switching in Cu-Doped $ \hbox{SiO}_{2}$ , 2007, IEEE Transactions on Electron Devices.
[136] R. Waser,et al. Switching the electrical resistance of individual dislocations in single-crystalline SrTiO3 , 2006, Nature materials.
[137] G. Ghibaudo,et al. Review on high-k dielectrics reliability issues , 2005, IEEE Transactions on Device and Materials Reliability.
[138] Dietmar Schroeder,et al. Physical explanation of the barrier height temperature dependence in metal-oxide-semiconductor leakage current models , 2003 .
[139] J. Suehle. Ultrathin gate oxide reliability: physical models, statistics, and characterization , 2002 .
[140] Enrique Miranda,et al. Modeling of the I-V characteristics of high-field stressed MOS structures using a Fowler-Nordheim-type tunneling expression , 2002, Microelectron. Reliab..
[141] Marc Heyns,et al. Charge Transport after Hard Breakdown in Gate Oxides , 2002 .
[142] Byung Jin Cho,et al. Evolution of quasi-breakdown in thin gate oxides , 2002 .
[143] Yasuhisa Omura,et al. Transport characteristics of posthard breakdown thin silicon oxide films and consideration of physical models , 2002 .
[144] Gabriella Ghidini,et al. Noise characteristics of radiation-induced soft breakdown current in ultrathin gate oxides , 2001 .
[145] Giuseppe Iannaccone,et al. Current noise at the oxide hard-breakdown , 2001 .
[146] D. Bremaud,et al. Electrical current distribution across a metal–insulator–metal structure during bistable switching , 2001, cond-mat/0104452.
[147] John F. Conley,et al. Heavy-ion-induced soft breakdown of thin gate oxides , 2001 .
[148] Jordi Suñé,et al. Mesoscopic approach to the soft breakdown failure mode in ultrathin SiO2 films , 2001 .
[149] Jordi Suñé,et al. Analysis of the degradation and breakdown of thin SiO/sub 2/ films under static and dynamic tests using a two-step stress procedure , 2000 .
[150] R. Degraeve,et al. Reliability: a possible showstopper for oxide thickness scaling? , 2000 .
[151] Jordi Suñé,et al. Monitoring the degradation that causes the breakdown of ultrathin ( 2 gate oxides , 2000 .
[152] J. McPherson,et al. Molecular model for intrinsic time-dependent dielectric breakdown in SiO2 dielectrics and the reliability implications for hyper-thin gate oxide , 2000 .
[153] J. Stathis,et al. Ultra-thin oxide reliability for ULSI applications , 2000 .
[154] J. Stathis. Percolation models for gate oxide breakdown , 1999 .
[155] Salvatore Lombardo,et al. Soft breakdown of gate oxides in metal–SiO2–Si capacitors under stress with hot electrons , 1999 .
[156] D. Ting,et al. An embedded quantum wire model of dielectric breakdown , 1999 .
[157] Tanya Nigam,et al. Model for the current–voltage characteristics of ultrathin gate oxides after soft breakdown , 1998 .
[158] Tanya Nigam,et al. Soft breakdown in ultrathin gate oxides: Correlation with the percolation theory of nonlinear conductors , 1998 .
[159] J. McPherson,et al. UNDERLYING PHYSICS OF THE THERMOCHEMICAL E MODEL IN DESCRIBING LOW-FIELD TIME-DEPENDENT DIELECTRIC BREAKDOWN IN SIO2 THIN FILMS , 1998 .
[160] Alessandro Paccagnella,et al. Ionizing radiation induced leakage current on ultra-thin gate oxides , 1997 .
[161] S. Bruyère,et al. Dielectric reliability in deep-submicron technologies: From thin to ultrathin oxides , 1997 .
[162] K. Taniguchi,et al. Hot-electron-induced quasibreakdown of thin gate oxides , 1997 .
[163] Jack C. Lee,et al. Modeling of stress-induced leakage current in ultrathin oxides with the trap-assisted tunneling mechanism , 1997 .
[164] Gerard Ghibaudo,et al. Quasi-breakdown in ultrathin gate dielectrics , 1997 .
[165] James H. Stathis,et al. On the relationship between stress induced leakage currents and catastrophic breakdown in ultra-thin SiO2 based dielectrics , 1997 .
[166] Tanya Nigam,et al. Definition of dielectric breakdown for ultra thin (<2 nm) gate oxides , 1997 .
[167] K. Fu,et al. Partial breakdown of the tunnel oxide in floating gate devices , 1997 .
[168] Kenji Taniguchi,et al. Electrical stress-induced variable range hopping conduction in ultrathin silicon dioxides , 1997 .
[169] Jordi Suñé,et al. Breakdown of thin gate silicon dioxide films—A review , 1996 .
[170] M. Heyns,et al. Soft Breakdown of Ultra-Thin Gate Oxide Layers , 1995, ESSDERC '95: Proceedings of the 25th European Solid State Device Research Conference.
[171] Marc Heyns,et al. Wear-out of ultra-thin gate oxides during high-field electron tunnelling , 1995 .
[172] J. Moodera,et al. Large magnetoresistance at room temperature in ferromagnetic thin film tunnel junctions. , 1995, Physical review letters.
[173] D. Fleetwood,et al. Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal‐oxide‐semiconductor devices , 1993 .
[174] Hisashi Fukuda,et al. Oxide wearout phenomena of ultrathin SiO/sub 2/ film during high-field stress , 1992 .
[175] Juan A. López-Villanueva,et al. Analysis of the effects of constant‐current Fowler–Nordheim‐tunneling injection with charge trapping inside the potential barrier , 1991 .
[176] Jordi Suñé,et al. After-breakdown conduction through ultrathin SiO2 films in metal/insulator/semiconductor structures , 1991 .
[177] Jordi Suñé,et al. Nondestructive multiple breakdown events in very thin SiO2 films , 1989 .
[178] James Stasiak,et al. Trap creation in silicon dioxide produced by hot electrons , 1989 .
[179] B. Riccò,et al. High-field-induced degradation in ultra-thin SiO/sub 2/ films , 1988 .
[180] Y. Nissan-Cohen,et al. Trap generation and occupation dynamics in SiO2 under charge injection stress , 1986 .
[181] Chenming Hu,et al. Substrate hole current and oxide breakdown , 1986 .
[182] B. Ricco,et al. Novel Mechanism for Tunneling and Breakdown of Thin SiO 2 Films , 1983 .
[183] Paul A. Solomon,et al. Breakdown in silicon oxide−A review , 1977 .
[184] L.O. Chua,et al. Memristive devices and systems , 1976, Proceedings of the IEEE.
[185] M. Shatzkes,et al. On the nature of conduction and switching in SiO2 , 1974 .
[186] D. W. Ormond,et al. Dielectric Breakdown in Silicon Dioxide Films on Silicon I . Measurement and Interpretation , 1972 .
[187] L. Chua. Memristor-The missing circuit element , 1971 .
[188] N. Klein,et al. Switching and breakdown in films , 1971 .
[189] D. Morgan,et al. A model for filament growth and switching in amorphous oxide films , 1970 .
[190] A. David Pearson,et al. FILAMENTARY CONDUCTION IN SEMICONDUCTING GLASS DIODES , 1969 .
[191] J. O'dwyer,et al. Theory of Dielectric Breakdown in Solids , 1969 .
[192] J. Simmons,et al. New conduction and reversible memory phenomena in thin insulating films , 1967, Proceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences.
[193] P. Budenstein,et al. Breakdown Conduction in Al‐SiO‐Al Capacitors , 1967 .
[194] N. Klein,et al. The mechanism of self-healing electrical breakdown in MOS structures , 1966 .
[195] T. W. Hickmott. LOW-FREQUENCY NEGATIVE RESISTANCE IN THIN ANODIC OXIDE FILMS , 1962 .
[196] D. Ielmini,et al. Resistive Switching Device Technology Based on Silicon Oxide for Improved ON–OFF Ratio—Part I: Memory Devices , 2018, IEEE Transactions on Electron Devices.
[197] A. Edwards,et al. Total-Ionizing-Dose Effects on Resistance Stability of Programmable Metallization Cell Based Memory and Selectors , 2017, IEEE Transactions on Nuclear Science.
[198] J. Yang,et al. Memristors with diffusive dynamics as synaptic emulators for neuromorphic computing. , 2017, Nature materials.
[199] Diana Adler,et al. Electronic Transport In Mesoscopic Systems , 2016 .
[200] E. Miranda,et al. Multiple Diode-Like Conduction in Resistive Switching SiOx-Based MIM Devices , 2015, IEEE Transactions on Nanotechnology.
[201] Jordi Suñé,et al. Equivalent circuit modeling of the bistable conduction characteristics in electroformed thin dielectric films , 2015, Microelectron. Reliab..
[202] Anthony J. Kenyon,et al. Resistive switching in oxides , 2015 .
[203] J Joshua Yang,et al. Memristive devices for computing. , 2013, Nature nanotechnology.
[204] Uri C. Weiser,et al. TEAM: ThrEshold Adaptive Memristor Model , 2013, IEEE Transactions on Circuits and Systems I: Regular Papers.
[205] Jordi Suñé,et al. Electron transport through broken down ultra-thin SiO2 layers in MOS devices , 2004, Microelectron. Reliab..
[206] D. Dumin,et al. Oxide reliability : a summary of silicon oxide wearout, breakdown, and reliability , 2002 .
[207] Guido Groeseneken,et al. Relation between breakdown mode and location in short-channel nMOSFETs and its impact on reliability specifications , 2001 .
[208] Guido Groeseneken,et al. New insights in the relation between electron trap generation and the statistical properties of oxide breakdown , 1998 .
[209] J. Bass,et al. Excitation of a magnetic multilayer by an electric current , 1998 .
[210] Jordi Suñé,et al. Exploratory observations of post‐breakdown conduction in polycrystalline‐silicon and metal‐gated thin‐oxide metal‐oxide‐semiconductor capacitors , 1993 .
[211] D. Lamb,et al. A non-filamentary switching action in thermally grown silicon dioxide films , 1967 .
[212] N. Mott,et al. Electronic Processes In Non-Crystalline Materials , 1940 .