A plasmonically enhanced pixel structure for uncooled microbolometer detectors

This paper introduces a method of broadband absorption enhancement that can be integrated with the conventional suspended microbolometer process with no significant additional cost. The premise of this study is that electric field can be enhanced throughout the structural layer of the microbolometer, resulting in an increase in the absorption of the infrared radiation in the long wave infrared window. A concentric double C-shaped plasmonic geometry is simulated using the FDTD method, and this geometry is fabricated on suspended pixel arrays. Simulation results and FTIR measurements are in good agreement indicating a broadband absorption enhancement in the 8 µm-12 µm range for LWIR applications. The enhancement is attained using metallic geometries embedded in the structural layer of the suspended microbridge, where the metallic-dielectric interface increases the average absorption of a 35 µm pixel from 67.6% to 80.1%.