论文信息 - The effect of line roughness on DUV scatterometry

The effect of line roughness on DUV scatterometry

The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.

Sebastian Heidenreich | Bernd Bodermann | Markus Bär | Mark-Alexander Henn | Hermann Gross

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