Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements

We report on a new approach in analog photolithography for the manufacturing of optical elements with a continuous profile. It is based on a phase-only mask used in a mask aligner.The advantage of this new approach is that it is contact free, i.e.there is a gap between the mask and the substrate during the exposure. That allows a non-destructive mask lithography.

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