X-ray diffraction and electrical characterization of photo-CVD zirconium oxide layers

[1]  Ian W. Boyd,et al.  Structural and electrical characteristics of zirconium oxide layers derived by photo-assisted sol–gel processing , 2002 .

[2]  J. J. Yu,et al.  Formation of stable zirconium oxide on silicon by photo-assisted sol–gel processing , 2002 .

[3]  Eduard A. Cartier,et al.  Materials characterization of ZrO2–SiO2 and HfO2–SiO2 binary oxides deposited by chemical solution deposition , 2001 .

[4]  Jack C. Lee,et al.  Electrical and reliability characteristics of ZrO2 deposited directly on Si for gate dielectric application , 2000 .

[5]  J. Robertson Band offsets of wide-band-gap oxides and implications for future electronic devices , 2000 .

[6]  A. Stesmans,et al.  Trap-assisted tunneling in high permittivity gate dielectric stacks , 2000 .

[7]  V. Teixeira,et al.  Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering gases , 2000 .

[8]  Evgeni P. Gusev,et al.  Structure and stability of ultrathin zirconium oxide layers on Si(001) , 2000 .

[9]  S. George,et al.  ZrO2 film growth by chemical vapor deposition using zirconium tetra-tert-butoxide , 1999 .

[10]  C. W. Chen,et al.  Schottky barrier heights of tantalum oxide, barium strontium titanate, lead titanate, and strontium bismuth tantalate , 1999 .

[11]  S. Louie,et al.  Structural properties and quasiparticle band structure of zirconia , 1998 .

[12]  C. Serna,et al.  Optical constants of tetragonal and cubic zirconias in the infrared , 1996 .

[13]  Balzaretti,et al.  Pressure dependence of the refractive index of monoclinic and yttria-stabilized cubic zirconia. , 1995, Physical review. B, Condensed matter.

[14]  Ching,et al.  Experimental and theoretical determination of the electronic structure and optical properties of three phases of ZrO2. , 1994, Physical review. B, Condensed matter.

[15]  Y. Takahashi,et al.  Chemical vapour deposition of undoped and spinel-doped cubic zirconia film using organometallic process , 1986 .

[16]  M. Balog,et al.  The chemical vapour deposition and characterization of ZrO2 films from organometallic compounds , 1977 .