Fabrication of high quality Ge virtual substrates by selective epitaxial growth in shallow trench isolated Si (001) trenches
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Gang Wang | Wilfried Vandervorst | Marc Heyns | Hugo Bender | Patrick Ong | Marc Meuris | Matty Caymax | Bart Blanpain | Shotaro Takeuchi | Alain Moussa | B. De Jaeger | Laurent Souriau | R. Loo | G. Wang | H. Bender | R. Loo | M. Caymax | M. Heyns | M. Meuris | W. Vandervorst | B. Blanpain | A. Moussa | P. Ong | L. Souriau | S. Takeuchi | B. D. Jaeger | W. Lee | J. C. Lin | W. Lee | W. Lee
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