Effect of beam blur in mask fabrication
暂无分享,去创建一个
Seong-Woon Choi | Woo-Sung Han | Jung-Min Sohn | Seung-Hune Yang | Seong-Yong Moon | Won-Tai Ki | Tae Moon Jeong
[1] Kimitoshi Takahashi,et al. Impact of the Coulomb interaction effect on delineating densely repeated 0.1-μm patterns using electron-beam block exposure , 1997, Advanced Lithography.
[2] Warren K. Waskiewicz,et al. Writing strategy for a high-throughput SCALPEL system , 1999, Advanced Lithography.
[3] Warren K. Waskiewicz,et al. Electron-optics method for high-throughput in a SCALPEL system: preliminary analysis , 1998 .
[4] Shigeru Moriya,et al. Quantitative factor analysis of resolution limit in electron beam lithography using the edge roughness evaluation method , 2000 .
[5] Gregg M. Gallatin,et al. Marks for SCALPEL® tool optics optimization , 2000 .