Energy-band parameter of atomic layer deposited Al2O3 & sulphur passivated molecular beam epitaxially grown (110) In0.53Ga0.47As surfaces
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P. Hurley | I. Thayne | S. Monaghan | R. Droopad | Xu Li | U. Peralagu | I. Povey | O. Ignatova | Jun Lin | Y. Fu