Direct imprinting of microcircuits on graphene oxides film by femtosecond laser reduction

Summary Graphene microcircuits have been successfully created on graphene oxide films via direct femtosecond laser reduction process according to preprogrammed patterns. Atomic force microscopy (AFM) characterization shows that surface height of the micropatterns was lower than the rest of the film due to the loss of oxygen confirmed by XPS and XRD techniques. The electric resistivity and conductivity of as-reduced graphene have strong dependences on output power of femtosecond laser. Moreover, current–voltage curves of graphene microcircuits show typical linear relationship, indicating the stable conductivities. The micro-nanoprocessing of graphene through femtosecond laser technologies might open the door for applications of graphene-based materials in electronic microdevices.