Projection maskless lithography
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Elmar Platzgummer | Hans Loeschner | Thomas Elster | Gerhard Stengl | Herbert Buschbeck | Olaf Fortagne | Gertraud Lammer | Christoph Brandstatter | Hans-Joachim Doring
[1] Elmar Platzgummer,et al. Large-field particle beam optics for projection and proximity printing and for maskless lithography , 2003 .
[2] M. Broekaart,et al. Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction , 2003, SPIE Advanced Lithography.