Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.
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Masanobu Hasegawa | Akiyoshi Suzuki | Masahito Niibe | Katsuhiko Murakami | Takayuki Hasegawa | Chidane Ouchi | Jun Saito | Yucong Zhu | Katsumi Sugisaki | Seima Kato | Katsura Otaki | Masashi Okada | Mikihiko Ishii | Jun Kawakami | Zhiqiang Liu | Hideo Yokota
[1] Masanobu Hasegawa,et al. Recent progress of EUV wavefront metrology in EUVA , 2004, SPIE Optics + Photonics.
[2] Masanobu Hasegawa,et al. Double-grating lateral shearing interferometer for extreme ultraviolet lithography , 2004 .
[3] Masanobu Hasegawa,et al. Comparison of EUV interferometry methods in EUVA project , 2005, SPIE Advanced Lithography.
[4] Y Zhu,et al. Method for designing error-compensating phase-calculation algorithms for phase-shifting interferometry. , 2001, Applied optics.
[5] Kazuya Ota,et al. Shearing interferometry for at wavelength wavefront measurement of extreme-ultraviolet lithography projection optics , 2003 .
[6] Kenneth A. Goldberg,et al. Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system , 2000 .
[7] Jeffrey Bokor,et al. Direct comparison of EUV and visible-light interferometries , 1999, Advanced Lithography.
[8] M. Takeda,et al. Lateral aberration measurements with a digital Talbot interferometer. , 1984, Applied optics.