论文信息 - Hydrophobic coatings using atomic layer deposition and non-chlorinated precursors

Hydrophobic coatings using atomic layer deposition and non-chlorinated precursors

This paper describes an alternative method of depositing hydrophobic coatings on MEMS devices using atomic layer deposition (ALD) and non-chlorinated hydrophobic precursors. First, a thin film of Al/sub 2/O/sub 3/ is deposited via ALD and is used as a seed layer to prepare and optimize the MEMS surface for the attachment of the hydrophobic precursors. Subsequently, non-chlorinated alkylsilanes are chemically bonded to the surface hydroxyl groups on the ALD seed layer. This technique results in a dense and ordered hydro-phobic film with a water contact angle of 108/spl plusmn/2/spl deg/. Using MEMS cantilever beam arrays, hydrophobic ALD coated beams were determined to have an adhesion energy of 0.11/spl plusmn/0.03 mJ/m/sup 2/ at 100% humidity as compared to the same beams without coating of 12/spl plusmn/1 mJ/m/sup 2/.

[1] R. Maboudian,et al. Dichlorodimethylsilane as an anti-stiction monolayer for MEMS: a comparison to the octadecyltrichlorosilane self-assembled monolayer , 2001 .

[2] Carl P. Tripp,et al. Alkylchlorosilane reactions at the silica surface , 1995 .

[3] Y. Lee,et al. Atomic layer deposited protective coatings for micro-electromechanical systems , 2003 .

[4] R. Maboudian,et al. Wafer level anti-stiction coatings for MEMS , 2003 .

[5] Steven M. George,et al. Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry , 1997 .

[6] Steven M. George,et al. Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition , 2002 .

[7] Maarten P. de Boer,et al. The impact of solution agglomeration on the deposition of self-assembled monolayers , 2000 .

[8] Terry A. Michalske,et al. Accurate method for determining adhesion of cantilever beams , 1999 .

[9] C. Hsu,et al. Mechanical stability and adhesion of microstructures under capillary forces. II. Experiments , 1993 .

[10] Steven M. George,et al. Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence , 1995 .

[11] R. Maboudian,et al. Tribological Challenges in Micromechanical Systems , 2013 .