论文信息 - MODEL-BASED CONTROL OF RAPID

MODEL-BASED CONTROL OF RAPID

Tight control of the wafer temperature is essential in Rapid Thermal Processing (RTP) of semiconductor wafers. Of the various techniques for controlling the temperature, model- based control has the greatest potential for attaining the best performance. An identification of a statespace model based on the subpace-fitting technique results in an experiment- based model. Subsequently, a Linear Quadratic Gaussian (LQG) controller is &.Agned for M identified model. The identification technique and the controller are validated with experimental results based on an RTP system at Stanford Uni- versity.

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