Characterization of annular-structure RF LDMOS transistors using polyharmonic distortion model

An annular-structure lateral-diffused metal-oxide semiconductor (LDMOS) RF transistor with polyharmonic distortion (PHD) model characterized by nonlinear vector network analyzer is described in this paper. The devices were fabricated using a 0.5 µm LDMOS process. The DC, small-signal, and large-signal characteristics of RF LDMOS transistors with annular-structures were also studied in this work. Using the PHD model, the accuracy of intermodulation and time waveform is verified. Furthermore, the model via X-parameter shows good agreement without optimization.

[1]  Robert W. Dutton,et al.  Modeling, analysis, and design of RF LDMOS devices using harmonic-balance device simulation , 2000 .

[2]  M. Miller,et al.  A new empirical large signal model for silicon RF LDMOS FETs , 1997, 1997 IEEE MTT-S Symposium on Technologies for Wireless Applications Digest.

[3]  J. Cai,et al.  A novel high performance stacked LDD RF LDMOSFET , 2001, IEEE Electron Device Letters.

[4]  Guo-Wei Huang,et al.  Characterization of RF Lateral-Diffused Metal–Oxide–Semiconductor Field-Effect Transistors with Different Layout Structures , 2007 .

[5]  A. Wood,et al.  High performance silicon LDMOS technology for 2 GHz RF power amplifier applications , 1996, International Electron Devices Meeting. Technical Digest.

[6]  W.R. Curtice,et al.  A new dynamic electro-thermal nonlinear model for silicon RF LDMOS FETs , 1999, 1999 IEEE MTT-S International Microwave Symposium Digest (Cat. No.99CH36282).

[7]  O. Tornblad An electrothermal BSIM3 model for large-signal operation of RF power LDMOS devices , 2002 .

[8]  D.E. Root,et al.  Polyharmonic distortion modeling , 2006, IEEE Microwave Magazine.

[9]  Diego Cabello,et al.  Performance analysis of high-speed MOS transistors with different layout styles , 2005, 2005 IEEE International Symposium on Circuits and Systems.

[10]  S. Kamohara,et al.  High performance RF power LDMOSFETs for cellular handsets formed in thick-strained-Si/relaxed-SiGe structure , 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

[11]  Isao Yoshida,et al.  High power LDMOS for cellular base station applications , 2001, Proceedings of the 13th International Symposium on Power Semiconductor Devices & ICs. IPSD '01 (IEEE Cat. No.01CH37216).

[12]  S. Kamohara,et al.  Thick-Strained-Si/Relaxed-SiGe Structure of High-Performance RF Power LDMOSFETs for Cellular Handsets , 2006, IEEE Transactions on Electron Devices.