On a Cumulative Model of Dielectric Breakdown in Solids

Dielectric breakdown in solids defies simple classification, and no existing theory is capable of accounting for the totality of the observed phenomena. However, the physical nature of the processes involved may be inferred from the statistical nature of breakdown, from the essential role of charge carriers and defects, and from the discreteness of the resulting breakdown channel. Analysis shows that classical avalanche phenomena are unlikely to be the dominant mechanism because charge carriers in the virgin materials do not normally have sufficient energy to cause the required damage. A cumulative model is proposed, based on the proposition that a smaller amount of energy is required to extend a pre-existing defect than to create one in the first place. Successive stages of the ¿conditioning¿ process of insulators by electric fields involve the creation of ¿clusters¿ of defects, their subsequent growth in the direction of the field, and the eventual joining of these elongated defects into a discrete breakdown channel. Breakdown at short times and in thin samples which occurs in many materials at fields of the order of 1 GV/m may be understood in terms of massive electron tunnelling through the image-force-lowered barrier, leading to rapid destruction of the material.

[1]  Co-operative effects in non-linear relaxation , 1981 .

[2]  A. Jonscher Dielectric relaxation in solids , 1983 .

[3]  A. Hippel,et al.  Electric Breakdown of Glasses and Crystals as a Function of Temperature , 1941 .

[4]  Peter H. Fischer,et al.  The Short-Time Electric Breakdown Behavior of Polyethylene , 1974, IEEE Transactions on Electrical Insulation.

[5]  J. Vermeer The impulse breakdown strength of pyrex glass , 1954 .

[6]  E. Harari Dielectric breakdown in electrically stressed thin films of thermal SiO2 , 1978 .

[7]  G. G. Stokes "J." , 1890, The New Yale Book of Quotations.

[8]  J. M. Aitken,et al.  Location of positive charges in SiO2 films on Si generated by vuv photons, x rays, and high‐field stressing , 1977 .

[9]  J. Hanscomb Impurity and Time Effects in the Electrical Breakdown of Alkali Halides , 1970 .

[10]  J. O'dwyer,et al.  Theory of Dielectric Breakdown in Solids , 1969 .

[11]  K. Möstl Conduction electrons in KBr at fields close to breakdown , 1974 .

[12]  H. Fröhlich,et al.  Theory of Electrical Breakdown in Ionic Crystals , 1937 .

[13]  N. Klein,et al.  Electrical Breakdown in Solids , 1969 .

[14]  L. Dissado,et al.  Dielectric behaviour of materials undergoing dipole alignment transitions , 1980 .

[15]  A. Jonscher,et al.  Poole-Frenkel conduction in high alternating electric fields , 1971 .

[16]  D. Ferry Electron transport and breakdown in SiO2 , 1979 .

[17]  A. Jonscher,et al.  The dielectric behaviour of condensed matter and its many-body interpretation , 1983 .

[18]  P. Fischer Chapter 8 – Dielectric Breakdown Phenomena in Polymers , 1982 .

[19]  P. Solomon,et al.  Current and C-V Instabilities in Si02 at High Fields , 1977 .

[20]  Physical basis of dielectric breakdown , 1980 .

[21]  L. Lamont Abstract: High‐rate magnetically enhanced sputter sources: Their basic physics and operational characteristics , 1977 .

[22]  J. Calderwood,et al.  Electrical conduction in dielectrics at high fields , 1975 .

[23]  A. Shepherd,et al.  Semiconductors , 1967, Nature.

[24]  L. Solymar,et al.  Lectures on the electrical properties of materials , 1970 .

[25]  L. A. Dissado,et al.  Examination of the statistics of dielectric breakdown , 1983 .

[26]  A. Hippel,et al.  Breakdown of ionic crystals by electron avalanches , 1949 .

[27]  A. Jonscher A new understanding of the dielectric relaxation of solids , 1981 .

[28]  R. M. Hill,et al.  Single carrier transport in thin dielectric films , 1967 .

[29]  E. Harari,et al.  Conduction and trapping of electrons in highly stressed ultrathin films of thermal SiO2 , 1977 .