First demonstration of ferroelectric Si:HfO2 based 3D FE-FET with trench architecture for dense nonvolatile memory application
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J. V. Houdt | J. van Houdt | A. Milenin | S. Mcmitchell | G. V. D. Bosch | G. Van den bosch | K. Banerjee | L. Breuil | M. Pak | J. Stiers | L. di Piazza | L. Piazza