Environmentally friendly patterning of thin films in linear methyl siloxanes

A number of green solvents have been explored to reduce the environmental impact of many chemical processes. Among them, linear methyl siloxanes make up a class of solvents that are low in toxicity, VOC exempt and not ozone-depleting. In addition, their unique physical properties such as low surface tension and low viscosity can mitigate several issues encountered with conventional processing solvents. In order to understand the behavior of linear methyl siloxanes as processing solvents, the solubilities of polymers and small molecular glasses are studied in this work. Using lithography as a test of solubility differences, we have successfully shown patterning of thin films in linear methyl siloxanes thereby demonstrating their utility in processing organic systems.

[1]  Leonid Ionov,et al.  Environment-friendly photolithography using poly(N-isopropylacrylamide)-based thermoresponsive photoresists. , 2009, Journal of the American Chemical Society.

[2]  Qinghuang Lin,et al.  A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist , 1997 .

[3]  R. Ayothi,et al.  Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography , 2006 .

[4]  C. Willson,et al.  Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate , 1999 .

[5]  William D. Hinsberg,et al.  Measurement of Thin‐Film Dissolution Kinetics Using a Quartz Crystal Microbalance , 1986 .

[6]  R. Atkinson Kinetics of the gas-phase reactions of a series of organosilicon compounds with hydroxyl and nitrate(NO3) radicals and ozone at 297 .+-. 2 K , 1991 .

[7]  D. W. Hairston Degreasers : Lift up and split out , 1996 .

[8]  J. Sherman,et al.  Solvent replacement for green processing. , 1998, Environmental health perspectives.

[9]  Nelson Felix,et al.  Study of the Structure−Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography , 2008 .

[10]  Andrew I. Cooper,et al.  Polymer synthesis and processing using supercritical carbon dioxide , 2000 .

[11]  Qinghuang Lin,et al.  Design of photoresists with reduced environmental impact. 1. Water-soluble resists based on photo-cross-linking of poly(vinyl alcohol) , 1999 .

[12]  Paul T Anastas,et al.  Green chemistry: science and politics of change. , 2002, Science.

[13]  N. Hüsing,et al.  Simultaneous drying and chemical modification of hierarchically organized silica monoliths with organofunctional silanes , 2005 .

[14]  K. Shakesheff,et al.  Materials processing in supercritical carbon dioxide: surfactants, polymers and biomaterials , 2004 .

[15]  Dwight E. Williams Volatile Methyl Siloxanes: Environmentally Sound Solvent Systems , 2000 .

[16]  Christopher K. Ober,et al.  An overview of supercritical CO 2 applications in microelectronics processing , 2003 .