X-Ray Lithography On Beam Line III-IV (3°) At SSRL

In recent months at SSRL, we have tested the feasibility of in vacuo x-ray lithographic studies using synchrotron radiation by exposing the resists PMMA and FBM-l20 to the white-light radiation in Beam Line (3°) during parasitic operation. Frequency selection was performed with Al and Ti filters, and the results of the experiment and their implications are presented in this report. A brief discussion of the advantages of synchrotron radiation for high-resolution x-ray microlithography research is also presented.