Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
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Jacob L. Jones | T. Nishida | S. Moghaddam | X. Sang | E. Grimley | J. Lebeau | Peng Zhao | P. Lomenzo | Q. Takmeel | M. Nelson | C. Fancher
暂无分享,去创建一个
Jacob L. Jones | T. Nishida | S. Moghaddam | X. Sang | E. Grimley | J. Lebeau | Peng Zhao | P. Lomenzo | Q. Takmeel | M. Nelson | C. Fancher