Micro-electro-mechanical systems fast fabrication by selective thick polysilicon growth in epitaxial reactor
暂无分享,去创建一个
M. Denoual | O. Bonnaud | O. Sagazan | P. Guil | D. Gaudin
[1] J. Singh,et al. A process technique to engineer the stress of thick doped polysilicon films for MEMS applications , 2002, Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614).
[2] B. Legrand,et al. High-frequency high-Q micro-mechanical resonators in thick epipoly technology with post-process gap adjustment , 2002, Technical Digest. MEMS 2002 IEEE International Conference. Fifteenth IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.02CH37266).
[3] Bernd Folkmer,et al. A new silicon rate gyroscope , 1998, Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176.
[4] Tung-Sheng Kuan,et al. Low‐temperature selective epitaxial growth of silicon at atmospheric pressure , 1989 .
[5] D. Bensahel,et al. Selective epitaxial silicon growth in the 650–1100 °C range in a reduced pressure chemical vapor deposition reactor using dichlorosilane , 1989 .