Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns
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Clifford L. Henderson | Peter J. Ludovice | Richard A. Lawson | Andrew J. Peters | Benjamin D. Nation | C. Henderson | P. Ludovice
[1] K Schulten,et al. VMD: visual molecular dynamics. , 1996, Journal of molecular graphics.
[2] Marcus Müller,et al. Monte carlo simulation of coarse grain polymeric systems. , 2009, Physical review letters.
[3] Clifford L. Henderson,et al. Coarse grained molecular dynamics model of block copolymer directed self-assembly , 2013 .
[4] Michael A. Morris,et al. Directed self-assembly of block copolymers for nanocircuitry fabrication , 2015 .
[5] Mark Somervell,et al. Pattern scaling with directed self assembly through lithography and etch process integration , 2012, Advanced Lithography.
[6] Wen-li Wu,et al. Three-dimensional x-ray metrology for block copolymer lithography line-space patterns , 2013 .
[7] Ofir Montal,et al. Directed self-assembly defectivity assessment. Part II , 2012, Advanced Lithography.
[8] E. Kramer,et al. SCFT Simulations of Thin Film Blends of Block Copolymer and Homopolymer Laterally Confined in a Square Well , 2009 .
[9] Marcus Müller,et al. Morphology of multi-component polymer systems: single chain in mean field simulation studies. , 2006, Soft matter.
[10] Marcus Müller,et al. Simulations of theoretically informed coarse grain models of polymeric systems. , 2010, Faraday discussions.
[11] Giuseppe Milano,et al. Generation of Well-Relaxed All-Atom Models of Large Molecular Weight Polymer Melts: A Hybrid Particle-Continuum Approach Based on Particle-Field Molecular Dynamics Simulations. , 2014, Journal of chemical theory and computation.
[12] L. Leibler. Theory of Microphase Separation in Block Copolymers , 1980 .
[13] Pak Lui,et al. Strong scaling of general-purpose molecular dynamics simulations on GPUs , 2014, Comput. Phys. Commun..
[14] Clifford L. Henderson,et al. Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers , 2014, Advanced Lithography.
[15] Kris T. Delaney,et al. Self-consistent field theory of directed self-assembly in laterally confined lamellae-forming diblock copolymers , 2012, Advanced Lithography.
[16] Clifford L. Henderson,et al. Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers , 2014 .
[17] G. Fredrickson,et al. Block copolymer thermodynamics: theory and experiment. , 1990, Annual review of physical chemistry.
[18] Wolfgang Paul,et al. A soft-quadrumer model for diblock copolymers , 2010 .
[19] Juan J. de Pablo,et al. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features , 2013 .
[20] Joshua A. Anderson,et al. General purpose molecular dynamics simulations fully implemented on graphics processing units , 2008, J. Comput. Phys..
[21] Vincent Wiaux,et al. Interactions of double patterning technology with wafer processing, OPC and design flows , 2008, SPIE Advanced Lithography.
[22] Juan J de Pablo,et al. Directed copolymer assembly on chemical substrate patterns: a phenomenological and single-chain-in-mean-field simulations study of the influence of roughness in the substrate pattern. , 2008, Langmuir : the ACS journal of surfaces and colloids.
[23] Glenn H. Fredrickson,et al. Fluctuation effects in a symmetric diblock copolymer near the order–disorder transition , 1990 .
[24] Marcus Müller,et al. Theoretically informed coarse grain simulations of polymeric systems. , 2009, The Journal of chemical physics.
[25] Juan J. de Pablo,et al. Interpolation in the Directed Assembly of Block Copolymers on Nanopatterned Substrates: Simulation and Experiments , 2010 .