Lithography and Other Patterning Techniques for Future Electronics
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[1] R. Fabian Pease,et al. Scaled measurements of global space-charge induced image blur in electron beam projection system , 2000 .
[2] Wei Zhang,et al. Air cushion press for excellent uniformity, high yield, and fast nanoimprint across a 100 mm field. , 2006, Nano letters.
[3] Jan Mulkens,et al. The next phase for immersion lithography , 2006, SPIE Advanced Lithography.
[4] Jian Wang,et al. Large area direct nanoimprinting of SiO2–TiO2 gel gratings for optical applications , 2003 .
[5] J. Warlaumont. X‐ray lithography: On the path to manufacturing , 1989 .
[6] Winfried Kaiser,et al. EUCLIDES: European EUVL Program , 1999 .
[7] Wei Zhang,et al. 6 nm half-pitch lines and 0.04 µm2 static random access memory patterns by nanoimprint lithography , 2005 .
[8] Yasuhiro Ohmura,et al. Current status and future prospect of immersion lithography , 2006, SPIE Advanced Lithography.
[9] A. Wong. Optical Imaging in Projection Microlithography , 2005 .
[10] S. Chou,et al. Ultrafast and direct imprint of nanostructures in silicon , 2002, Nature.
[11] Wei Zhang,et al. Sub-10 nm imprint lithography and applications , 1997, 1997 55th Annual Device Research Conference Digest.
[12] Masaki Yamabe. Present status of x-ray lithography , 1998, Photomask and Next Generation Lithography Mask Technology.
[13] Harry J. Levinson,et al. Principles of Lithography , 2001 .
[14] Pieter Kruit,et al. Predicted effect of shot noise on contact hole dimension in e-beam lithography , 2006 .
[15] G. G. Shahidi. SOI technology for the GHz era , 2002, IBM J. Res. Dev..
[16] J. Vine,et al. An electron imaging system for the fabrication of integrated circuits , 1969 .
[17] Zhaoning Yu,et al. Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff , 2003 .
[18] R.H. Dennard,et al. Design Of Ion-implanted MOSFET's with Very Small Physical Dimensions , 1974, Proceedings of the IEEE.
[19] D. R. Herriott,et al. Double‐aperture method of producing variably shaped writing spots for electron lithography , 1978 .
[20] Qiangfei Xia,et al. In situ real time monitoring of nanosecond imprint process , 2006 .
[21] Jan Haisma,et al. Mold‐assisted nanolithography: A process for reliable pattern replication , 1996 .
[22] Masanori Idesawa,et al. Design of a variable‐aperture projection and scanning system for electron beam , 1978 .
[23] Martha I. Sanchez,et al. Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists , 2001, IBM J. Res. Dev..
[24] Glenn H. Fredrickson,et al. Dynamics of Block Copolymers: Theory and Experiment , 1996 .
[25] C. Willson,et al. Step and flash imprint lithography: Template surface treatment and defect analysis , 2000 .
[26] R. Fabian Pease,et al. Distributed axis electron beam technology for maskless lithography and defect inspection , 2003 .
[27] George M. Whitesides,et al. Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol ‘‘ink’’ followed by chemical etching , 1993 .
[28] Jacques Trotel. Dynamic beam shaping , 1978 .
[29] G. Whitesides,et al. Molecular self-assembly and nanochemistry: a chemical strategy for the synthesis of nanostructures. , 1991, Science.
[30] G. Whitesides,et al. New approaches to nanofabrication: molding, printing, and other techniques. , 2005, Chemical reviews.
[31] Roger Fabian W. Pease,et al. Space-charge-induced aberrations , 1999 .
[32] E. Kratschmer,et al. Electron‐beam microcolumns for lithography and related applications , 1996 .
[33] G. G. Shahidi,et al. SOI technology for the GHz era , 2001, 2001 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers (Cat. No.01TH8517).
[34] Lloyd R. Harriott,et al. Focused-ion-beam repair of phase-shift photomasks , 1992, Advanced Lithography.
[35] Rajesh Menon,et al. Absorbance-modulation optical lithography. , 2006, Journal of the Optical Society of America. A, Optics, image science, and vision.
[36] Roger Fabian W. Pease,et al. Exploiting structure in fast aerial image computation for integrated circuit patterns , 1997 .
[37] J. Rogers,et al. Additive, nanoscale patterning of metal films with a stamp and a surface chemistry mediated transfer process: Applications in plastic electronics , 2002 .
[38] P. Kruit,et al. High throughput electron lithography with the multiple aperture pixel by pixel enhancement of resolution concept , 1998 .
[39] C. Grant Willson,et al. Implementation of an imprint damascene process for interconnect fabrication , 2006 .
[40] Zhaoning Yu,et al. Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications , 2001 .
[41] C. T. Black,et al. Nanometer-scale pattern registration and alignment by directed diblock copolymer self-assembly , 2004, IEEE Transactions on Nanotechnology.
[42] C. G. Willson,et al. Introduction to microlithography : theory, materials, and processing , 1983 .
[43] Wei Zhang,et al. Pattern transfer fidelity of nanoimprint lithography on six-inch wafers , 2002 .
[44] Yusuke Matsunaga,et al. Technology mapping technique for throughput enhancement of character projection equipment , 2006, SPIE Advanced Lithography.
[45] Feng Zhang,et al. Pattern Registration Between Spherical Block‐Copolymer Domains and Topographical Templates , 2006 .
[46] S. Chou,et al. Roller nanoimprint lithography , 1998 .
[47] Michael D. Stewart,et al. Nanofabrication with step and flash imprint lithography , 2005 .
[48] C. Ross,et al. Templated Self‐Assembly of Block Copolymers: Effect of Substrate Topography , 2003 .
[49] J. W. Stafford,et al. EBES: A practical electron lithographic system , 1975, IEEE Transactions on Electron Devices.
[50] D D Leavitt,et al. Dynamic beam shaping. , 1990, Medical dosimetry : official journal of the American Association of Medical Dosimetrists.
[51] Stephen Y. Chou,et al. Imprint of sub-25 nm vias and trenches in polymers , 1995 .
[52] Rainer Kaesmaier,et al. Ion projection lithography: International development program , 1999 .
[53] T. R. Groves,et al. Distributed, multiple variable shaped electron beam column for high throughput maskless lithography , 1998 .
[54] Wei Zhang,et al. Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels , 2003 .
[55] Bo Cui,et al. Large area high density quantized magnetic disks fabricated using nanoimprint lithography , 1998 .
[56] H. C. Pfeiffer. Variable spot shaping for electron‐beam lithography , 1978 .
[57] Peter D. Rhyins,et al. Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography , 2001 .
[58] Hans Meiling,et al. First performance results of the ASML alpha demo tool , 2006, SPIE Advanced Lithography.
[59] S. Sreenivasan,et al. Patterned wafer defect density analysis of step and flash imprint lithography , 2008 .
[61] C. T. Black. Self-aligned self assembly of multi-nanowire silicon field effect transistors , 2005 .
[62] Christopher Harrison,et al. Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter , 1997 .
[63] Hans Loschner,et al. Ion projection lithography , 1998, Photomask and Next Generation Lithography Mask Technology.
[64] John N. Randall,et al. The contrast of ion beam stencil masks , 1986 .
[65] Roger Fabian W. Pease,et al. Dot matrix electron beam lithography , 1983 .
[66] C. G. Willson,et al. Introduction to microlithography , 1994 .
[67] Stephen Y. Chou,et al. Direct three-dimensional patterning using nanoimprint lithography , 2001 .
[68] M. Levenson,et al. Improving resolution in photolithography with a phase-shifting mask , 1982, IEEE Transactions on Electron Devices.
[69] E. W. Edwards,et al. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures , 2005, Science.
[70] S. Chou,et al. Imprint Lithography with 25-Nanometer Resolution , 1996, Science.