论文信息 - Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications - 字舞流文

Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications

B. Alharthi | A. Mosleh | W. Du | M. Mortazavi | H. Naseem | Shui-Qing Yu | W. Dou | Baohua Li | P. Grant | J. Grant | Timothy A. Morgan