Compositional and electrical properties of SiO2/Si3N4/SiO2 stacked films grown onto silicon substrates and annealed in hydrogen
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P. Fiorani | L. Lozzi | S. Santucci | M. Passacantando | S. Santucci | L. Ottaviano | R. Alfonsetti | P. Picozzi | G. Moccia | A. D. Giacomo