Problems of PLD hybrid technique for CNx films creation
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Highly nitrogenated CNx films were created by pulsed laser deposition (PLD), combined with radiofrequency (RF) and hollow cathode (HC) discharges. The RF discharge was held between two electrodes situated parallel to plasma plume from a graphite target. In PLD combined with HC discharges an one of the RF electrodes was used to supply nitrogen on the substrate. The N/C ratio higher than 1 was measured. Deposition set-up and its various modifications and an accuracy of composition measurement of CNx layers by WDX and RBS methods are discussed.