Cluster-free B-doped a-Si:H films deposited using SiH4 + B10H14 multi-hollow discharges
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K. Nakahara | D. Yamashita | K. Koga | M. Shiratani | N. Itagaki | G. Uchida | M. Sato | Y. Kawashima | T. Matsunaga | Hidefumi Matsuzaki | W. M. Nakamura | Kousuke Yamamoto