Subwavelength antireflection gratings for photovoltaic cells in visible and near-infrared wavelengths
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In this study, we have fabricated a two-dimensional antireflection subwavelength grating (SWG) on a GaSb substratefor application to a photovoltaic cell. The SWG has consisted of 350 nm period tapered grating. In the fabrication, electron beam (EB) lithography and fast atom beam (FAB) etching have been used. We have demonstrated that the SWG works well for reducing the reflection even at the temperature of 240/spl deg/C. To our knowledge, the SWG is fabricated on the GaSb substrate for the first time.
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