Development of functional sub-100 nm structures with 3D two-photon polymerization technique and optical methods for characterization

Investigations of two-photon polymerization (TPP) with sub-100 nm in the structuring resolution are presented by using photosensitive sol-gel material. The high photosensitivity of this material allows for TPP using a large variety in laser pulse durations covering a range between sub-10 fs and ≈140 fs. In this study, the authors demonstrate TPP structuring to obtain sub-100 nm in resolution by different approaches, namely, by adding a cross-linker to the material and polymerization with sub-10 fs short pulses. Additionally, a simulation and model based characterization method for periodic sub-100 nm structures was implemented and applied in an experimental white light interference Fourier-Scatterometry setup.

[1]  Victor A. Soifer,et al.  Methods for Computer Design of Diffractive Optical Elements , 2001 .

[2]  Stephen Barlow,et al.  65 nm feature sizes using visible wavelength 3-D multiphoton lithography. , 2007, Optics express.

[3]  M. Totzeck,et al.  Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields , 2001 .

[4]  Simon Ward,et al.  Comparison of solutions to the scatterometry inverse problem , 2004, SPIE Advanced Lithography.

[5]  Wolfgang Osten,et al.  Simulations of Scatterometry Down to 22 nm Structure Sizes and Beyond with Special Emphasis on LER , 2009 .

[6]  Hong‐Bo Sun,et al.  Rapid sub-diffraction-limit laser micro/nanoprocessing in a threshold material system , 2002 .

[7]  Christopher Raymond,et al.  Overview Of Scatterometry Applications In High Volume Silicon Manufacturing , 2005 .

[8]  S. Kawata,et al.  Three-dimensional microfabrication with two-photon-absorbed photopolymerization. , 1997, Optics letters.

[9]  Yan Li,et al.  Reduction in feature size of two-photon polymerization using SCR500 , 2007 .

[10]  Saulius Juodkazis,et al.  Two-photon lithography of nanorods in SU-8 photoresist , 2005 .

[11]  Andy Steinmann,et al.  Sub-10-fs pulses from a MHz-NOPA with pulse energies of 0.4 microJ. , 2010, Optics express.

[12]  Satoshi Kawata,et al.  Finer features for functional microdevices , 2001, Nature.

[13]  Aleksandr Ovsianikov,et al.  Fabrication of woodpile structures by two-photon polymerization and investigation of their optical properties. , 2004, Optics express.

[14]  Andy Steinmann,et al.  Passively mode-locked and cavity-dumped Yb:KY(WO(4))(2) oscillator with positive dispersion. , 2007 .

[15]  C. Fotakis,et al.  Ultra-low shrinkage hybrid photosensitive material for two-photon polymerization microfabrication. , 2008, ACS nano.

[16]  B N Chichkov,et al.  Femtosecond laser-induced two-photon polymerization of inorganic-organic hybrid materials for applications in photonics. , 2003, Optics letters.

[17]  Satoshi Kawata,et al.  Two-photon photopolymerization and 3D lithographic microfabrication , 2005 .

[18]  László Szikszai,et al.  Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write , 2009, Advanced Lithography.

[19]  Jan Liesener,et al.  Model-based white light interference microscopy for metrology of transparent film stacks and optically-unresolved structures , 2009 .

[20]  Seth R. Marder,et al.  Two-photon polymerization initiators for three-dimensional optical data storage and microfabrication , 1999, Nature.

[21]  W. Osten,et al.  Depth sensitive Fourier-Scatterometry for the characterization of sub-100 nm periodic structures , 2011, Optical Metrology.

[22]  Sérgio Pereira,et al.  Performance analysis of coherent optical scatterometry , 2011 .

[23]  C. Raymond,et al.  Scatterometry for Semiconductor Metrology , 2001 .

[24]  R. K. Nasyrov,et al.  Zone-boundary optimization for direct laser writing of continuous-relief diffractive optical elements. , 2006, Applied optics.