Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

Nanoscale periodic structures have been utilized in the scintillator field to obtain enhanced light extraction efficiency. Sufficient structure depth is necessary to achieve better extraction efficiency. Recently, a soft X-ray interference lithography (SXIL) has been developed in the Shanghai Synchrotron Radiation Facility (SSRF). SXIL can be used to fabricate a high aspect ratio pattern due to the uniform distribution of the beam dose at the photoresist depth. A grating mask with a new photon stop layer was attempted, mainly consisting of Perm alloy, and it was optimized for the SXIL to increase the entire service life. Preliminary results suggest that PMMA structure with an aspect ratio of up to 3 has been successfully manufactured using SXIL techniques. Therefore, this technique has been studied to fabricate the artificial nanostructure on the scintillator in the high efficiency radiation detector area. Display Omitted Soft X-ray interference lithography (SXIL) is developed in SSRF.The relationship between the transmission rate and the exposed profile is analyzed.A Perm alloy photon stop layer is used to improve the service life of grating mask.SXIL has been used in the high efficiency radiation detector research field.

[1]  S. Petralia,et al.  Optically Transparent, Ultrathin Pt Films as Versatile Metal Substrates for Molecular Optoelectronics , 2006 .

[2]  P. Lecoq,et al.  Probing the Concepts of Photonic Crystals on Scintillating Materials , 2008, IEEE Transactions on Nuclear Science.

[3]  Harun H. Solak,et al.  Sub-50 nm period patterns with EUV interference lithography , 2003 .

[4]  Y. Ekinci,et al.  Fabrication of quasiperiodic nanostructures with EUV interference lithography , 2012, Nanotechnology.

[5]  W. Smith,et al.  Practical understanding and use of surface enhanced Raman scattering/surface enhanced resonance Raman scattering in chemical and biological analysis. , 2008, Chemical Society reviews.

[6]  A. Yoshikawa,et al.  Recent R&D Trends in Inorganic Single‐Crystal Scintillator Materials for Radiation Detection , 2015 .

[7]  J. Zhao,et al.  Geometrical and morphological optimizations of plasmonic nanoarrays for high-performance SERS detection. , 2015, Nanoscale.

[8]  Yasin Ekinci,et al.  20nm Line/space patterns in HSQ fabricated by EUV interference lithography , 2007 .

[9]  Shuanghao Wu,et al.  Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography , 2015 .

[10]  Chad A Mirkin,et al.  Gold nanoparticles for biology and medicine. , 2010, Angewandte Chemie.

[11]  Takeo Watanabe,et al.  Development of interference lithography for 22nm node and below , 2011 .

[12]  Yasin Ekinci,et al.  Interference lithography at EUV and soft X-ray wavelengths , 2015 .

[13]  D. Attwood.  X-Rays and Extreme Ultraviolet Radiation: Principles and Applications , 2017 .

[14]  Yasin Ekinci,et al.  Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths. , 2014, Optics letters.

[15]  H. Solak.  Space-invariant multiple-beam achromatic EUV interference lithography , 2005 .

[16]  R. Spolenak,et al.  Large area arrays of metal nanowires , 2008 .

[17]  Yiping Zhao,et al.  Novel nanostructures for SERS biosensing , 2008 .

[18]  C. David,et al.  Four-wave EUV interference lithography , 2002 .

[19]  Yasin Ekinci,et al.  Advanced holographic methods in extreme ultraviolet interference lithography , 2011, NanoScience + Engineering.

[20]  Yanqing Wu,et al.  Development of broadband X-ray interference lithography large area exposure system. , 2016, The Review of scientific instruments.

[21]  M. Gu,et al.  Improved light extraction efficiency of cerium-doped lutetium-yttrium oxyorthosilicate scintillator by monolayers of periodic arrays of polystyrene spheres , 2013 .