157-nm lithography with high numerical aperture lens for 70-nm technology node
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Toshiro Itani | Takamitsu Furukawa | Malcolm C. Gower | Kunio Watanabe | Julian S. Cashmore | Toshifumi Suganaga | Noriyoshi Kanda | Jae-Hwan Kim | Osamu Yamabe | Seiro Miyoshi