GeSn Technology: Impact of Sn on Ge CMOS Applications

S. Zaima, O. Nakatsuka, Y. Shimura, S. Takeuchi, B. Vincent, F. Gencarelli, T. Clarysse, J. Demeulemeester, K. Temst, A. Vantomme, M. Caymax, and R. Loo Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan Research Fellow of the Japan Society for the Promotion of Science Covalent Silicon Co., Higashikou, Seirou-machi, Kitakanbara-gun, Niigata 957-0197, Japan imec, Kapeldreef 75, B-3001 Leuven, Belgium Instituut voor Kernen Stralingsfysica, Katholieke Universiteit Leuven, B-3001 Leuven, Belgium