论文信息 - Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas - 字舞流文

Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas

C. Clerc | T. Girardeau | F. Yubero | S. Camelio | J. Cotrino | Á. Barranco | A. González‐Elipe