Temporally resolved Schwarzschild microscope for the characterization of extreme ultraviolet emission in laser-produced plasmas
暂无分享,去创建一个
Hiroaki Nishimura | N. Miyanaga | Mitsuo Nakai | Tomoharu Okuno | Y. Tao | Nobuyoshi Ueda | T. Fujiwara | Y. Izawa | S. Fujioka | Y. Izawa | N. Miyanaga | S. Fujioka | M. Nakai | H. Nishimura | Y. Tao | N. Ueda | T. Okuno | T. Fujiwara
[1] M. Kado,et al. Development of a Schwarzschild-type x-ray microscope. , 1991, Optics letters.
[2] Hiroaki Nishimura,et al. Monochromatic imaging and angular distribution measurements of extreme ultraviolet light from laser-produced Sn and SnO2 plasmas , 2004 .
[3] C. Cerjan,et al. Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime , 1996 .
[4] Martin Richardson,et al. High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography , 2004 .