Gate electrode effects on low-frequency (1/ f) noise in p-MOSFETs with high-? dielectrics

[1]  Eddy Simoen,et al.  Effect of Nitridation on Low-Frequency (1/f) Noise in n- and p-MOSFETS with HFO2 Gate Dielectrics , 2006 .

[2]  M. Copel,et al.  Materials Interaction at the Nanoscale in High-k Metal Gate Stacks: The Role of Oxygen , 2006 .

[3]  M. Jurczak,et al.  Ni fully GermanoSilicide for gate electrode application in pMOSFETs with HfSiON gate dielectrics , 2006, IEEE Transactions on Electron Devices.

[4]  C. Ciofi,et al.  Comparative study of drain and gate low-frequency noise in nMOSFETs with hafnium-based gate dielectrics , 2006, IEEE Transactions on Electron Devices.

[5]  Eddy Simoen,et al.  Low-Frequency Noise Performance of HfO2-Based Gate Stacks , 2005 .

[6]  Eduard A. Cartier,et al.  Oxygen defects and Fermi level location in metal-hafnium oxide-silicon structures , 2005 .

[7]  W. P. Maszara,et al.  Fully Silicided Metal Gates for High-Performance CMOS Technology: A Review , 2005 .

[8]  D. Misra,et al.  Impact of high-k gate stack material with metal gates on LF noise in n- and p-MOSFETs , 2005 .

[9]  Eddy Simoen,et al.  Tunneling 1/ f ? noise in 5 nm HfO 2/2.1 nm SiO 2 gate stack n-MOSFETs , 2005 .

[10]  John Robertson,et al.  Interfaces and defects of high-K oxides on silicon , 2005 .

[11]  Tsu-Jae King,et al.  Impact of oxygen vacancies on high-/spl kappa/ gate stack engineering , 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..

[12]  Mikael Östling,et al.  Low-frequency noise in Si0.7Ge0.3 surface channel pMOSFETs with ALD HfO2/Al2O3 gate dielectrics , 2004 .

[13]  Fang Wang,et al.  Low-frequency noise in submicrometer MOSFETs with HfO/sub 2/, HfO/sub 2//Al/sub 2/O/sub 3/ and HfAlO/sub x/ gate stacks , 2004, IEEE Transactions on Electron Devices.

[14]  S. De Gendt,et al.  Achievements and challenges for the electrical performance of MOSFETs with high-k gate dielectrics , 2004, Proceedings of the 11th International Symposium on the Physical and Failure Analysis of Integrated Circuits. IPFA 2004 (IEEE Cat. No.04TH8743).

[15]  A. Mercha,et al.  Low-frequency noise behavior of SiO/sub 2/--HfO/sub 2/ dual-layer gate dielectric nMOSFETs with different interfacial oxide thickness , 2004, IEEE Transactions on Electron Devices.

[16]  Luigi Pantisano,et al.  Passivation and interface state density of SiO2/HfO2-based/polycrystalline-Si gate stacks , 2003 .

[17]  peixiong zhao,et al.  Unified model of hole trapping, 1/f noise, and thermally stimulated current in MOS devices , 2002 .

[18]  R. Wallace,et al.  High-κ gate dielectrics: Current status and materials properties considerations , 2001 .

[19]  Cor Claeys,et al.  On the flicker noise in submicron silicon MOSFETs , 1999 .

[20]  Cor Claeys,et al.  Noise as a Diagnostic Tool for Semiconductor Material and Device Characterization , 1998 .

[21]  D. Fleetwood,et al.  Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal‐oxide‐semiconductor devices , 1993 .

[22]  Charles G. Sodini,et al.  A 1/f noise technique to extract the oxide trap density near the conduction band edge of silicon , 1989 .

[23]  Hsiang,et al.  Surface mobility fluctuations in metal-oxide-semiconductor field-effect transistors. , 1987, Physical review. B, Condensed matter.

[24]  Zeynep Celik-Butler,et al.  Spectral dependence of 1ƒγ noise on gate bias in n-MOSFETS , 1987 .

[25]  I. Lundström,et al.  Low frequency noise in MOS transistors—I Theory , 1968 .

[26]  Eddy Simoen,et al.  Impact of the high vertical electric field on low-frequency noise in thin-gate oxide MOSFETs , 2003 .

[27]  Zeynep Celik-Butler,et al.  Determination of Si-SiO/sub 2/ interface trap density by 1/f noise measurements , 1988 .

[28]  S. M. Sze Physics of semiconductor devices /2nd edition/ , 1981 .

[29]  S. M. Sze,et al.  Physics of semiconductor devices , 1969 .